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Conduction studies on chemical bath-deposited nanocrystalline CdS thin films

Identifieur interne : 007D48 ( Main/Repository ); précédent : 007D47; suivant : 007D49

Conduction studies on chemical bath-deposited nanocrystalline CdS thin films

Auteurs : RBID : Pascal:07-0334094

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English descriptors

Abstract

Chemically pure, stoichiometric cadmium sulphide (CdS) films were produced by the chemical bath deposition (CBD) method on suitably cleaned silicon (Si) wafer and indium-tin oxide (ITO) substrates at room temperature. The nanocrystalline film was found to be hexagonal in structure with the preferential orientation along the (0 0 2) plane. Variable-range hopping conduction through 66 nm thick CdS films on ITO substrates was found to be responsible at the low voltage while space charge-limited conduction became dominant at a relatively high bias voltage.

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Pascal:07-0334094

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<title xml:lang="en" level="a">Conduction studies on chemical bath-deposited nanocrystalline CdS thin films</title>
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<name sortKey="Pradhan, Basudev" uniqKey="Pradhan B">Basudev Pradhan</name>
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<name sortKey="Ray, Asim K" uniqKey="Ray A">Asim K. Ray</name>
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<term>Electronic properties</term>
<term>Hexagonal lattices</term>
<term>Hopping conduction</term>
<term>II-VI semiconductors</term>
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<term>Polycrystals</term>
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<term>Cellule solaire</term>
<term>Si</term>
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<div type="abstract" xml:lang="en">Chemically pure, stoichiometric cadmium sulphide (CdS) films were produced by the chemical bath deposition (CBD) method on suitably cleaned silicon (Si) wafer and indium-tin oxide (ITO) substrates at room temperature. The nanocrystalline film was found to be hexagonal in structure with the preferential orientation along the (0 0 2) plane. Variable-range hopping conduction through 66 nm thick CdS films on ITO substrates was found to be responsible at the low voltage while space charge-limited conduction became dominant at a relatively high bias voltage.</div>
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<s0>Chemically pure, stoichiometric cadmium sulphide (CdS) films were produced by the chemical bath deposition (CBD) method on suitably cleaned silicon (Si) wafer and indium-tin oxide (ITO) substrates at room temperature. The nanocrystalline film was found to be hexagonal in structure with the preferential orientation along the (0 0 2) plane. Variable-range hopping conduction through 66 nm thick CdS films on ITO substrates was found to be responsible at the low voltage while space charge-limited conduction became dominant at a relatively high bias voltage.</s0>
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